Ionic species in a silane plasma

Journal Article · Fri Aug 01 04:00:00 EDT 1980 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.91907· OSTI ID:5205725

Haller, I

The abundances A/sub j/ of groups of higher silane ions Si/sub j/H/sup +//sub k/ were measured mass spectrometrically in an rf glow discharge in SiH/sub 4/ under conditions used for preparation of hydrogenated amorphous silicon. The ratio A/sub j//A/sub j/-1 is about 0.3 nearly independently of j, of pressure, of degree of ionization, and of rf power. The mean hydrogen to silicon ratio for j> or =3 is 1.5 +- 0.1 and pressure independent in the 0.017--0.100-Torr range. A mechanism postulating charge or hydride ion transfer and the addition of SiH/sub 4/ as the most rapid reactions of silane ions is consistent with the observations.

• Research Organization: IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598
• OSTI ID: 5205725
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 37:3; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700102* -- Fusion Energy-- Plasma Research-- Diagnostics
AMORPHOUS STATE
CHARGED PARTICLES
CHEMICAL REACTIONS
DATA
ELECTRIC DISCHARGES
HYDRIDES
HYDROGEN COMPOUNDS
HYDROGENATION
INFORMATION
IONIC COMPOSITION
IONS
MASS SPECTROSCOPY
MATHEMATICAL MODELS
MEDIUM VACUUM
PLASMA
PRESSURE DEPENDENCE
QUANTITY RATIO
SILANES
SILICON COMPOUNDS
SPECTROSCOPY