Ion and radical reactions in the silane glow discharge deposition of a-Si:H films

Journal Article · Mon Mar 01 04:00:00 EST 1982 · Plasma Chem. Plasma Process.; (United States)

DOI:https://doi.org/10.1007/BF00566858· OSTI ID:5244170

Turban, G; Catherine, Y; Grolleau, B

A mass spectrometric analysis of the positive ions and neutral products in a silane glow discharge has been performed. The active species, created by dissociation, disproportionation, and ion-molecule reactions are mainly SiH/sub 2/, SiH/sub 3/, and H. A calculation of the distribution of the SiH/sup +/ /SUB n/ ions shows that the silane concentration monitors the abundance of SiH/sup +//sub 3/. diffusional transport of radicals toward the discharge-tube walls can explain the observed deposition rates. The study of SiH/sub 4/-SiD/sub 4/ and SiH/sub 4/-D/sub 2/ plasmas emphasizes several reactions which modify the free-radical populations depending on the discharge conditions: disproportionation, termination, recombination, and abstration. Heterogeneous reactions have also been observed: etching of the film by H atoms and direct incorporation of hydrogen in the growing film. A general scheme for the plasma deposition mechanism is proposed.

• Research Organization: Univ. de Nantes, Nantes
• OSTI ID: 5244170
• Journal Information: Plasma Chem. Plasma Process.; (United States), Journal Name: Plasma Chem. Plasma Process.; (United States) Vol. 2:1; ISSN PCPPD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
AMORPHOUS STATE
CHARGED PARTICLES
CHEMICAL RADIATION EFFECTS
CHEMICAL REACTION KINETICS
CHEMICAL REACTIONS
CHEMISTRY
COLLISIONS
DECOMPOSITION
DEPOSITION
DISSOCIATION
ELECTRIC DISCHARGES
ELECTRON TUBES
ELEMENTS
ETCHING
FILMS
GAS DISCHARGE TUBES
GLOW DISCHARGES
HYDRIDES
HYDROGEN
HYDROGEN COMPOUNDS
ION COLLISIONS
ION-MOLECULE COLLISIONS
IONIZATION
IONS
KINETICS
MOLECULAR IONS
MOLECULE COLLISIONS
NONMETALS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
PHOTOCHEMICAL REACTIONS
PHOTOLYSIS
PLASMA ARC SPRAYING
RADIATION CHEMISTRY
RADIATION EFFECTS
RADICALS
RADIOLYSIS
REACTION KINETICS
RECOMBINATION
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SPRAY COATING
SURFACE COATING
SURFACE FINISHING
THIN FILMS