Preparation and magnetic properties of Co-Cr films by toroidal plasma (TP) type sputtering

Conference · Fri Sep 01 04:00:00 EDT 1989 · IEEE (Institute of Electrical and Electronics Engineers) Transactions on Magnetics; (USA)

OSTI ID:5175883

Takahashi, T ^[1]; Nao, M ^[2]

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1. Dept. of Electrical Engineering, Toyama Univ., Toyama 930 (JP)
2. Dept. of Physical Electronics, Tokyo Institute of Technology, Tokyo (JP)

The authors describe a new type of sputtering apparatus which can form a stable toroidal plasma developed in order to deposit magnetic films with a homogeneous and dense structure and excellent properties under the conditions of low argon gas pressure, low applied voltage and low substrate temperature around 30 {sup 0}C. All Co-Cr films deposited by this apparatus were composed of hcp phase crystallites with c-axis orientation {Delta}{theta}/sub 50/ ranging from 8 to 13{sup 0}. The saturation magnetization Ms varied from 380 to 780 emu/cc and perpendicular coercivity Hc varied from 100 to 300 Oe.

• OSTI ID: 5175883
• Report Number(s): CONF-890309--
• Conference Information: Journal Name: IEEE (Institute of Electrical and Electronics Engineers) Transactions on Magnetics; (USA) Journal Volume: 25:5
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
360602 -- Other Materials-- Structure & Phase Studies
360603 -- Materials-- Properties
656003* -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ARGON
CHROMIUM
COBALT
CRYSTAL STRUCTURE
ELEMENTS
FABRICATION
FILMS
FLUIDS
GASES
GRAIN ORIENTATION
MAGNETIC DISKS
MAGNETIC PROPERTIES
MAGNETIC STORAGE DEVICES
MEMORY DEVICES
METALS
MICROSTRUCTURE
NONMETALS
ORIENTATION
PHYSICAL PROPERTIES
RARE GASES
SPUTTERING
THIN FILMS
TRANSITION ELEMENTS