Improvement of toroidal plasma (TP) type sputtering for depositing Co-Cr films on plasma-free substrates

Journal Article · Sat Sep 01 00:00:00 EDT 1990 · IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (USA)

DOI:https://doi.org/10.1109/20.104464· OSTI ID:5944873

Takahashi, T; Ikeda, N ^[1]; Naoe, M ^[2]

---

1. Toyama Univ. (Japan). Faculty of Engineering
2. Tokyo Inst. of Tech. (Japan). Faculty of Engineering

Co-Cr films for perpendicular recording have been deposited by the toroidal plasma (TP) type sputtering method with applying a magnetic field by a solenoid coil, or by attaching a magnet to the outer pole to change the plasma state during sputtering. By applying the magnetic field by the solenoid coil, discharge current, film thickness and film composition, saturation magnetization Ms of 480{approximately}800 emu/cc and coercivity Hc of 250 {approximately}350 Oe in the films depended on the plasma state. On the other hand, by attaching the magnet to the outer pole, the magnetic flux distribution in front of the target plane was significantly improved. Therefore, the applied voltage to electrodes was lower from 520 to 440 V at Ar gas pressure of 0.2 Pa. The erosion profile of targets was changed. The variation in the film thickness and the Co content over the whole film plane were reduced.

• OSTI ID: 5944873
• Journal Information: IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (USA), Journal Name: IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (USA) Vol. 26:5; ISSN IEMGA; ISSN 0018-9464
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
360102 -- Metals & Alloys-- Structure & Phase Studies
360104 -- Metals & Alloys-- Physical Properties
656003 -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALLOYS
CHEMICAL COMPOSITION
CHROMIUM ALLOYS
COBALT ALLOYS
COERCIVE FORCE
DIMENSIONS
ELECTRIC COILS
ELECTRICAL EQUIPMENT
EQUIPMENT
EROSION
FILMS
MAGNETIC FIELDS
MAGNETIC FLUX
PLASMA
SOLENOIDS
SPUTTERING
THICKNESS
THIN FILMS