Structure and mechanical properties of hydrogenated carbon films prepared by magnetron sputtering

Journal Article · Fri Nov 01 04:00:00 EST 1991 · IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States)

DOI:https://doi.org/10.1109/20.278773· OSTI ID:5160806

Marchon, B; Vo, P N; Khan, M R ^[1]; Ager, II, J W ^[2]

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1. Seagate Magnetics, Fremont, CA (US)
2. Lawrence Berkeley Lab., CA (United States). Center for Advanced Materials

This paper reports on hydrogenated thin carbon films which have been prepared by DC-magnetron sputtering in an hydrogen-containing Argon atmosphere. A monotonic decrease in friction buildup as well as an increase in abrasion resistance is observed for increasing hydrogen proportion in Argon, from 0 to 5%. At the same time, Raman data shows higher sp{sup 3} character and an increase in hydrogen content in the film, as monitored with FTIR, is observed. Resistivity measurements also show a transition from conductor to insulator. For very high hydrogen content, the film becomes increasingly softer. These data are attributed to an initial increase in the sp{sup 3}/sp{sup 2} bonding ratio, followed by a loss of three-dimensional cross-linking eventually leading to polymerization.

• DOE Contract Number: AC03-76SF00098
• OSTI ID: 5160806
• Journal Information: IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) Vol. 27:6; ISSN IEMGA; ISSN 0018-9464
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
360602 -- Other Materials-- Structure & Phase Studies
360603* -- Materials-- Properties
360606 -- Other Materials-- Physical Properties-- (1992-)
ARGON
CARBON
CHEMICAL REACTIONS
CROSS-LINKING
CRYSTAL STRUCTURE
ELECTRICAL PROPERTIES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FILMS
FLUIDS
FRICTION
GASES
HYDROGENATION
INTERNAL FRICTION
MAGNETRONS
MECHANICAL PROPERTIES
MICROSTRUCTURE
MICROWAVE EQUIPMENT
MICROWAVE TUBES
NONMETALS
PHYSICAL PROPERTIES
POLYMERIZATION
RAMAN SPECTRA
RARE GASES
SPECTRA
SPUTTERING
THIN FILMS