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Organometallic vapor phase epitaxial growth of GaAs/sub 0. 5/Sb/sub 0. 5/

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.94874· OSTI ID:5138801
The pseudobinary III/V system GaAs/sub 1-y/Sb/sub y/ is well known to have a solid phase miscibility gap with a critical temperature of 751 /sup 0/C. We have succeeded in growing epitaxial layers of GaAs/sub 0.5/Sb/sub 0.5/ lattice matched to InP at temperatures of 600 and 630 /sup 0/C using the organometallic vapor phase epitaxy technique. The key requirement is a III/V ratio of greater than unity. This leads to the incorporation of all As and Sb reaching the interface and the ability to grow metastable alloys. The epitaxial GaAs/sub 0.5/Sb/sub 0.5/ layers have excellent surface morphology and efficient photoluminescence at a wavelength of 1.6 ..mu..m.
Research Organization:
Department of Materials Science, University of Utah, Salt Lake City, Utah 84112
DOE Contract Number:
AT03-81ER10934
OSTI ID:
5138801
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 44:7; ISSN APPLA
Country of Publication:
United States
Language:
English