High-intensity, heavy negative ion sources based on the sputter principle (invited)
Journal Article
·
· Review of Scientific Instruments; (United States)
- Oak Ridge National Laboratory, P. O. Box 2008, Oak Ridge, Tennessee 37831-6368 (United States)
Due to their ease of operation, simplicity, long lifetime, and wide range of species capabilities, negative ion sources predicated on the sputter principle are being used for an increasing number of diverse applications. Sources based on this technology have been developed which utilize either direct cesium-surface ionization, or a plasma seeded with cesium to form positive ion beams for sputtering sample materials from which negative ion beams are generated. This article will include a brief review of the fundamental processes underlying negative ion formation by the sputter technique, as well as describe a selected number of recent ion source developments which exemplify the state-of-the art of this technology.
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 5095324
- Journal Information:
- Review of Scientific Instruments; (United States), Journal Name: Review of Scientific Instruments; (United States) Vol. 65:4; ISSN 0034-6748; ISSN RSINAK
- Country of Publication:
- United States
- Language:
- English
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