A high brightness plasma sputter heavy negative ion source
Conference
·
OSTI ID:6943493
A high-intensity, pulsed-mode, plasma-sputter heavy negative ion source has been developed; this source holds promise for a number of uses, including tandem electrostatic accelerator/synchrotron injection applications. To date, the source has been used to generate mA intensities from more than 18 sputter probes. A brief description of the source and typical performance data for a number of ion species are given. In addition, basic ion source operational data, such as intensity versus cesium oven temperature, sputter probe voltage, and discharge pressure, along with emittance data, are presented. 12 refs., 11 figs., 2 tabs.
- Research Organization:
- Oak Ridge National Lab., TN (USA)
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 6943493
- Report Number(s):
- CONF-881151-36; ON: DE89003107
- Country of Publication:
- United States
- Language:
- English
Similar Records
A high-intensity plasma sputter heavy negative ion source
A high-intensity plasma-sputter heavy negative ion source
High-intensity plasma-sputter heavy negative-ion source (invited)
Conference
·
Thu Dec 31 23:00:00 EST 1987
·
OSTI ID:6591029
A high-intensity plasma-sputter heavy negative ion source
Conference
·
Sat Dec 31 23:00:00 EST 1988
·
OSTI ID:5898594
High-intensity plasma-sputter heavy negative-ion source (invited)
Conference
·
Sun Dec 31 23:00:00 EST 1989
· Review of Scientific Instruments; (USA)
·
OSTI ID:6908312