A high-intensity plasma sputter heavy negative ion source
Conference
·
OSTI ID:6591029
A high-intensity, pulsed-mode, plasma-sputter heavy negative ion source has been developed; this source holds promise for a number of uses, including tandem electrostatic accelerator/synchrotron injection applications. To date, the source has been used to generate mA intensities from more than 18 sputter probes. A brief description of the source and typical performance data for a number of ion species are given. 13 refs., 6 figs., 2 tabs.
- Research Organization:
- Oak Ridge National Lab., TN (USA)
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 6591029
- Report Number(s):
- CONF-8810242-1; ON: DE89003113
- Country of Publication:
- United States
- Language:
- English
Similar Records
A high brightness plasma sputter heavy negative ion source
A high-intensity plasma-sputter heavy negative ion source
Design features of an axial-geometry, plasma-sputter, heavy negative ion source
Conference
·
Thu Dec 31 23:00:00 EST 1987
·
OSTI ID:6943493
A high-intensity plasma-sputter heavy negative ion source
Conference
·
Sat Dec 31 23:00:00 EST 1988
·
OSTI ID:5898594
Design features of an axial-geometry, plasma-sputter, heavy negative ion source
Conference
·
Sat Dec 31 23:00:00 EST 1988
·
OSTI ID:5521586