High-intensity plasma-sputter heavy negative-ion source (invited)

Conference · Mon Jan 01 04:00:00 EST 1990 · Review of Scientific Instruments; (USA)

OSTI ID:6908312

Alton, G D ^[1]; Mori, Y; Takagi, A; Ueno, A; Fukumoto, S ^[2]

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1. Oak Ridge National Laboratory, P. O. Box 2008, Oak Ridge, Tennessee 37831-6368 (US)
2. National Laboratory for High Energy Physics, 1-1 Oho, Tsukuba-shi, Ibaraki-ken 305, (Japan)

A multicusp magnetic field plasma-surface ion source, normally used for H{sup {minus}}ion-beam formation, has been modified for the generation of high-intensity, pulsed, heavy-negative-ion beams suitable for a variety of uses. A brief description of the source and basic pulsed-mode operational data (e.g., intensity versus cesium oven temperature, sputter probe voltage, and discharge pressure) are given. In addition, illustrative examples of intensity versus time and the mass distributions of ion beams extracted from a number of samples, along with emittance data, are also presented. Preliminary results obtained during dc operation of the source under low-discharge-power conditions suggest that sources of this type may alo be used to produce high-intensity (mA) dc beams.

• DOE Contract Number: AC05-84OR21400
• OSTI ID: 6908312
• Report Number(s): CONF-890703--
• Conference Information: Journal Name: Review of Scientific Instruments; (USA) Journal Volume: 61:1
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
430301* -- Particle Accelerators-- Ion Sources
ALKALI METALS
APPLIANCES
BEAM CURRENTS
BEAM EMITTANCE
BEAM INJECTION
BEAM MONITORS
BEAM PRODUCTION
BEAMS
CESIUM
CHARGED PARTICLES
CONTROL
CURRENTS
DISTRIBUTION
ELEMENTS
FARADAY CUPS
HEAVY IONS
HYDROGEN IONS
ION BEAMS
ION SOURCES
IONS
MAGNETIC FIELDS
MASS DISTRIBUTION
MEASURING INSTRUMENTS
METALS
MONITORS
NATIONAL ORGANIZATIONS
OPERATION
ORNL
OVENS
PARAMETRIC ANALYSIS
PERFORMANCE
PRESSURE CONTROL
SPATIAL DISTRIBUTION
SPUTTERING
TIME MEASUREMENT
US AEC
US DOE
US ERDA
US ORGANIZATIONS