Recent advancements in high intensity heavy negative ion sources based on the sputter principle

Conference · Sun Jan 01 00:00:00 EST 1989

OSTI ID:5891948

Alton, G D

Significant advancements have been recently made in the technology of forming high intensity heavy negative ion beams. Due to their ease of operation, simplicity, long lifetime, and wide range of species capabilities, negative ion sources predicated on the sputter principle are being used for an increasing number of diverse applications, including standard tandem accelerator-based research, high-energy ion implantation, tandem accelerator mass spectrometry, and low-energy atomic physics research. Sources have been developed which utilize either direct surface ionization, or a plasma to form the positive ion beam used to effect sputtering of samples containing the material of interest. This article will include a brief review of the fundamental processes underlying negative ion formation in these sources. Emphasis will be placed on the descriptions and performance characteristics of specific sources based on each of the positive ion formation techniques. 21 refs., 16 figs., 1 tab.

• Research Organization: Oak Ridge National Lab., TN (USA)
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 5891948
• Report Number(s): CONF-8905141-3; ON: DE89012503
• Resource Relation: Conference: 5. international conference on electrostatic accelerators and associated boosters, Strasbourg, France, 24-27 May 1989; Other Information: Portions of this document are illegible in microfiche products
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ION SOURCES
SPUTTERING
ANGULAR DISTRIBUTION
ANIONS
BEAM EMITTANCE
CESIUM IONS
DISTRIBUTION FUNCTIONS
IONIZATION
MOLYBDENUM IONS
SURFACE PROPERTIES
CHARGED PARTICLES
DISTRIBUTION
FUNCTIONS
IONS
640301* - Atomic
Molecular & Chemical Physics- Beams & their Reactions