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Molecular beam deposition of Dy sub 1 Ba sub 2 Cu sub 3 O sub 7 minus. delta. (001) high-temperature superconductor thin films

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
DOI:https://doi.org/10.1116/1.578076· OSTI ID:5003347
; ;  [1]
  1. University of Notre Dame, Department of Electrical Engineering, Notre Dame, Indiana 46556 (United States)

Epitaxial Dy{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7{minus}{delta}}(001) high-temperature superconductor thin films on LaAlO{sub 3} substrates have been prepared by coevaporation of Dy, BaF{sub 2}, and Cu and postannealing. The vapors in desired ratio were evaporated from effusion cells in a miniature molecular beam deposition system. The films show critical transition temperature ({ital T}{sub {ital c},0}) of 89.5{plus minus}0.5 K. During process development it was found that single phase Dy{sub 1+x}Ba{sub 2{minus}x}Cu{sub 3}O{sub y}(001) thin films can be grown ({ital x}=0 to 0.3). Their electrical properties were useful in calibration of quartz crystal thin film thickness monitor (FTM) for determination of relationships between the actual vapor arrival rate (flux) and FTM reading.

DOE Contract Number:
FG02-90ER45427
OSTI ID:
5003347
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 10:2; ISSN JVTAD; ISSN 0734-2101
Country of Publication:
United States
Language:
English

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