Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

SPUTTERING YIELDS. Annual Report, November 1, 1961-October 31, 1962. Report No. 2356

Technical Report ·
OSTI ID:4734685
Sputtering yield measurements for various metals under noble gas ion bombardment in the energy range 50 to 600 ev were essentially completed. Results for metals, including some rare earths, under He/sup +/, Ne/sup +/, Ar/sup +/, Kr/ sup +/, Xe/sup +/, a nd Hg/sup +/ hombardment are presented in over 200 yield curves. The spectroscopic technique for measuring sputtering threshold energies is described. This technique was applied to the measurement of the velocity distribution of sputtered atoms by pulsing a target and measuring the transit time of sputtered atoms to an observation point a known distance away from the target. Velocity distributions of atoms sputtered from polycrystalline and single crystal Cu targets are presented. Average velocities were found to be in the range 3 to 10 ev, in good agreement with previous measuremerts and much higher than those of thermally evaporated atoms. (auth)
Research Organization:
General Mills, Inc., Minneapolis
NSA Number:
NSA-17-008931
OSTI ID:
4734685
Report Number(s):
NP-12389
Country of Publication:
United States
Language:
English