SPUTTERING YIELDS. Annual Report, November 1, 1962 to October 31, 1963
Technical Report
·
OSTI ID:4109358
Energy distributions are determined for atoms sputtered from Cu (100), (110), and (111) surfaces as well as polycrystalline surfaces of about ten different target materials under Hg and noble gas ion bombardment in the range 80 to 1200 ev. Energies of sputtered atoms are found to depend markedly on the angle of ejection and the mass of the incident ion. The most probable energy (the energy at which the maximum occurs) is nearly independent of bombarding ion energy down to about 100 ev. At increasing bombarding ion energy the high energy tail in the energy distribution becomes more pronounced and causes the average energy to increase. Finally, an asymptotic value is reached at about 1000 ev bombarding ion energy. For Au-Ar/sup +/ the energy distribution at 1200 ev bombarding ion energy is fairly similar to that at 43 kev with the average energies of 18.5 and 20.5 ev, respectively. (auth)
- Research Organization:
- General Mills, Inc., Minneapolis
- NSA Number:
- NSA-18-007404
- OSTI ID:
- 4109358
- Report Number(s):
- NP-13430
- Country of Publication:
- United States
- Language:
- English
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Energy distributions and yields of sputtered neutral copper monomers and dimers determined by mass spectrometry. [100-1000 EV range]
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OSTI ID:4647137