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U.S. Department of Energy
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P-N JUNCTION FORMATION TECHNIQUES. Quarterly Technical Progress Report No. 3, May 20, 1963-September 1, 1963

Technical Report ·
OSTI ID:4629055
Investigations were continued on spectral response as a function of junction depth in p-on-n-type cells. A further blue shift was observed with lower implantation energy (100 kev), the equal photon relative response curve peaking at 6000 A. Graphically deterrnined values of minority carrier diffusion lengths in the surface region show a trend towards values equalling junction depth for low-energy implanted cells. Base diffusion lengths ( approximates 40 mu ) indicate a need for better starting material to obtain more efficient cells. An empirical curve that gives the relative efficiencies under solar and tungsten light (140 Mw/cm/sup 2/ incident) as a function of implantation energy was obtained. This curve shows good agreement with values predicted from spectral response curves. Results of profile investigations were inconclusive due to sheet resistance, contact resistance and forward leakage effects. In general, cells with drift fields in the surface region had higher efficiencies than linear profile cells. P-type-cells were implanted with phosphorous ions to make n-on-p cells. The first cells produced in this manner had efficiencies greater than 5% and spectral responses sirnilar to comparable p-on-n cells. Preliminary radiation damage studies on IPC and commercial cells were in sharp disagreement with results of other workers. This was apparently due to environmental effects on radiation damage rates, but further effort is required to obtain definite conclusions. (auth)
Research Organization:
Ion Physics Corp., Burlington, Mass.
NSA Number:
NSA-17-041521
OSTI ID:
4629055
Report Number(s):
AD-419705
Country of Publication:
United States
Language:
English

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