X-ray conversion efficiency using a high average power Nd:glass laser system

Conference · Tue Dec 31 04:00:00 EST 1996

OSTI ID:435490

Celliers, P; Silva, L da; Dane, C B ^[1]

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1. Lawrence Livermore National Lab., CA (United States); and others

Proximity x-ray lithography requires a high average power source of x-rays with photon energy around 1 keV. A viable laser-based x-ray source can meet the requirements of this application using Nd:glass laser technology. The authors have measured x-ray conversion efficiency from plasmas produced with a prototype high average power Nd:glass laser. This laser produced pulses of 13 ns FWHM duration with maximum energies of 20 J at 1.053 {micro}m wavelength and 12 J at 0.527 {micro}m wavelength. Solid targets of various L-shell emitters as well as one M-shell emitter (solid Xe) were examined using the fundamental and frequency-doubled wavelengths produced with this laser. Conversion efficiencies better than 12%/(2 {pi} sr) were measured for all targets using 0.527 {micro}m laser light.

• Sponsoring Organization: Lawrence Livermore National Lab., CA (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 435490
• Report Number(s): CONF-960634--
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
DESIGN
ELECTRONIC CIRCUITS
LASER-PRODUCED PLASMA
MASKING
NEODYMIUM LASERS
PERFORMANCE
X RADIATION
X-RAY SOURCES