X-ray conversion efficiency using a high average power Nd:glass laser system
- Lawrence Livermore National Lab., CA (United States); and others
Proximity x-ray lithography requires a high average power source of x-rays with photon energy around 1 keV. A viable laser-based x-ray source can meet the requirements of this application using Nd:glass laser technology. The authors have measured x-ray conversion efficiency from plasmas produced with a prototype high average power Nd:glass laser. This laser produced pulses of 13 ns FWHM duration with maximum energies of 20 J at 1.053 {micro}m wavelength and 12 J at 0.527 {micro}m wavelength. Solid targets of various L-shell emitters as well as one M-shell emitter (solid Xe) were examined using the fundamental and frequency-doubled wavelengths produced with this laser. Conversion efficiencies better than 12%/(2 {pi} sr) were measured for all targets using 0.527 {micro}m laser light.
- Sponsoring Organization:
- Lawrence Livermore National Lab., CA (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 435490
- Report Number(s):
- CONF-960634-; TRN: IM9710%%148
- Resource Relation:
- Conference: 1996 IEEE international conference on plasma science, Boston, MA (United States), 3-5 Jun 1996; Other Information: PBD: 1996; Related Information: Is Part Of IEEE conference record -- Abstracts: 1996 IEEE international conference on plasma science; PB: 324 p.
- Country of Publication:
- United States
- Language:
- English
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