Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser{sup a}
- Lawrence Livermore National Laboratory, University of California, Livermore, California 94550 (United States)
- Laser Plasma Interaction Section, Military University of Technology, Institute of Optoelectronics, 01-489 Warsaw 49 (Poland)
- IBM Microelectronics, Hopewell Junction, New York 12533 (United States)
- AT&T Bell Laboratories, Murray Hill, New Jersey 07974 (United States)
We measured the conversion efficiency of laser pulse energy into keV x rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns full width at half-maximum pulses at up to 20 J at 1.053 {mu}m and 12 J at 0.53 {mu}m. Targets were chosen to optimize emission in the 10{endash}15 A wavelength band, including {ital L}-shell emission from materials with atomic numbers in the range {ital Z}=24{endash}30 and {ital M}-shell emission from Xe ({ital Z}=54). With 1.053 {mu}m a maximum conversion of 11{percent} into 2{pi} sr was measured from solid Xe targets. At 0.527 {mu}m efficiencies of 12{percent}{endash}18{percent}/(2{pi} sr) were measured for all of the solid targets in the same wavelength band. The x-ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3{percent}/(2{pi} sr) when irradiated with 1.053 {mu}m. {copyright} {ital 1996 American Institute of Physics.}
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 286062
- Journal Information:
- Journal of Applied Physics, Vol. 79, Issue 11; Other Information: PBD: Jun 1996
- Country of Publication:
- United States
- Language:
- English
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