Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser. Revision 1
Abstract
We measured the conversion efficiency of laser pulse energy into keV x-rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns FWHM pulses at up to 20 J at 1.053 {mu}m and 12 J at 0.53 {mu}m. Targets where chosen to optimize emission in the l0--15 {angstrom} wavelength band, including L-shell emission from materials with atomic numbers in the range Z=24-30 and M-shell emission from Xe (Z=54). With 1.053 {mu}m a maximum conversion of 11% into 2{pi} sr was measured from solid Xe targets. At 0.527 {mu}m efficiencies of 12--18%/(2{pi}sr) were measured for all of the solid targets in the same wavelength band. The x-ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3%/(2{pi}sr) when irradiated with 1.053 {mu}m.
- Authors:
-
- and others
- Publication Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE, Washington, DC (United States)
- OSTI Identifier:
- 135528
- Report Number(s):
- UCRL-CR-121294-Rev.1
ON: DE96004050
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Technical Report
- Resource Relation:
- Other Information: PBD: Jul 1995
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; 70 PLASMA PHYSICS AND FUSION; X-RAY SOURCES; PERFORMANCE TESTING; ENERGY CONVERSION; SOFT X RADIATION; NEODYMIUM LASERS; LASER RADIATION; LASER-PRODUCED PLASMA; LASER TARGETS; PLASMA PRODUCTION; SCREEN PRINTING
Citation Formats
Celliers, P, DaSilva, L B, and Dane, C B. Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser. Revision 1. United States: N. p., 1995.
Web. doi:10.2172/135528.
Celliers, P, DaSilva, L B, & Dane, C B. Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser. Revision 1. United States. https://doi.org/10.2172/135528
Celliers, P, DaSilva, L B, and Dane, C B. 1995.
"Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser. Revision 1". United States. https://doi.org/10.2172/135528. https://www.osti.gov/servlets/purl/135528.
@article{osti_135528,
title = {Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser. Revision 1},
author = {Celliers, P and DaSilva, L B and Dane, C B},
abstractNote = {We measured the conversion efficiency of laser pulse energy into keV x-rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns FWHM pulses at up to 20 J at 1.053 {mu}m and 12 J at 0.53 {mu}m. Targets where chosen to optimize emission in the l0--15 {angstrom} wavelength band, including L-shell emission from materials with atomic numbers in the range Z=24-30 and M-shell emission from Xe (Z=54). With 1.053 {mu}m a maximum conversion of 11% into 2{pi} sr was measured from solid Xe targets. At 0.527 {mu}m efficiencies of 12--18%/(2{pi}sr) were measured for all of the solid targets in the same wavelength band. The x-ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3%/(2{pi}sr) when irradiated with 1.053 {mu}m.},
doi = {10.2172/135528},
url = {https://www.osti.gov/biblio/135528},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jul 01 00:00:00 EDT 1995},
month = {Sat Jul 01 00:00:00 EDT 1995}
}