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(110) [001] Secondary Recrystallization Texture in Three Percent Silicon-Iron

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.1723134· OSTI ID:4344919
The secondary recrystallization texture has been related to the structure developed during prior processing. The (110) STA001! component of the primary recrystallization texture, from which secondary grains grow, develops from the (111) (112) doublet component in the prior recrystallization texture. If the material undergoes two rather than one prior recrystailization heat treatments (each separated by a cold reduction), the amount of the (110) STA001! component in the primary recrystallization texture is in general increased and as a consequence the completeness of secondary recrystailization is promoted. (auth)
Research Organization:
General Electric Co., Schenectady, N.Y.
Sponsoring Organization:
USDOE
NSA Number:
NSA-12-007856
OSTI ID:
4344919
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 3 Vol. 29; ISSN JAPIAU; ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Country of Publication:
Country unknown/Code not available
Language:
English

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