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DEVELOPMENT OF PREFERRED ORIENTATIONS IN SILICON IRON

Journal Article · · Journal of Applied Physics (U.S.)
DOI:https://doi.org/10.1063/1.1723133· OSTI ID:4326320

The (110) STA001! texture in silicon iron arises by a process of secondary recrystailization after cold reduction of the strip in two stages separated by an anneal. It is possible to produce the same texture by a one- stage or a three-stage reduction process. The rolling textures and primary recrystallization textures for each of these processes have been experimentally determined and are all different. In spite of this the (110) STA001! secondary orientation develops in each case. It is tentatively suggested that impurities in the steel, already known to be important in controlling grain growth in silicon iron, also supply the directionai forces leading to the (110) STA001! texture. (auth)

Research Organization:
G.K.N. Group Research Lab., Wolverhampton, Eng.
Sponsoring Organization:
USDOE
NSA Number:
NSA-12-007855
OSTI ID:
4326320
Journal Information:
Journal of Applied Physics (U.S.), Journal Name: Journal of Applied Physics (U.S.) Vol. Vol: 29; ISSN JAPIA
Country of Publication:
Country unknown/Code not available
Language:
English

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