Target preparations and thickness measurements

Conference · Wed Jan 01 04:00:00 EST 1975

OSTI ID:4180645

Adair, H L; Kobisk, E H

A wide variety of isotope target preparative methods have been used, including rolling of metals, vapor deposition, electrodeposition, chemical vapor deposition, and sputtering, to obtain thin and thick films of most elements or compounds of elements in the Periodic Table. Most thin films prepared for use in self-supported form as well as those deposited on substrates require thickness measurement (atom count and distribution) and/or thickness uniformity determination before being used in nuclear research. Preparative methods are described together with thickness and uniformity determination procedures applicable to samples being prepared (in situ) and to completed samples. Only nondestructive methods are considered applicable to target samples prepared by the ORNL Solid State Division, Isotope Research Materials Laboratory. Thickness or areal density measurements of sufficient sophistication to yield errors of less than +-1 percent have been achieved with regularity. A statistical analysis procedure is applied which avoids error caused by balance zero-point drift in direct weight measurement methods. (auth)

• Research Organization: Oak Ridge National Lab., Tenn. (USA)
• NSA Number: NSA-33-003477
• OSTI ID: 4180645
• Report Number(s): CONF-750968--2
• Country of Publication: United States
• Language: English

Related Subjects

*TARGETS-- FABRICATION
360101* --Materials--Metals & Alloys--Preparation & Fabrication
CHEMICAL VAPOR DEPOSITION
ELECTRODEPOSITION
ELEMENTS
INORGANIC COMPOUNDS
MEASURING METHODS
MELTING
N50220* --Metals
Ceramics
& Other Materials--Metals & Alloys--Preparation & Fabrication
N50320 --Metals
Ceramics
& Other Materials--Plastics & Other Materials--Preparation & Fabrication
ROLLING
SPUTTERING
THICKNESS
VAPOR PLATING