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Fabrication of optical waveguides by ion-beam sputtering

Journal Article · · J. Vac. Sci. Technol., v. 13, no. 1, pp. 104-106
DOI:https://doi.org/10.1116/1.568872· OSTI ID:4041474
Films have been deposited by sputtering a target with a large-diameter ion beam which can be neutralized by electrons. The ion-beam diameter is defined by a 2-in. dia aperture in a Ta plate. Sputtering of this plate acts as a getter pump and substrates are introduced into the system through an airlock so that the residual gas pressure can be maintained in the 10$sup -6$ Pa range while the sputtering gas ambient is about 6x10$sup -3$ Pa. Excited species in the vicinity of the target are monitored by emission spectroscopy and the secondary ion mass spectra are measured using an electrostatic energy filter. The performance of the system has been determined by depositing optical waveguides using a Ta target and O and Ar ion beams. With an Ar$sup +$ beam, Ta films with the bcc structure were deposited whereas transparent, amorphous films were obtained using an ion beam containing O and Ar ions. The refractive index of the films was approximately 2.13, which is similar to the value for films reactively sputtered in a glow discharge, and the lowest optical loss was approximately 11 dB/cm. (AIP)
Research Organization:
Bell-Northern Research, P.O. Box 3511, Station C, Ottawa, Canada, K1Y 4H7
Sponsoring Organization:
USDOE
NSA Number:
NSA-33-030091
OSTI ID:
4041474
Journal Information:
J. Vac. Sci. Technol., v. 13, no. 1, pp. 104-106, Journal Name: J. Vac. Sci. Technol., v. 13, no. 1, pp. 104-106; ISSN JVSTA
Country of Publication:
United States
Language:
English