Electrical control of plasma spatial uniformity investigated by plasma laser-induced fluorescence

Journal Article · Sun Jan 31 23:00:00 EST 1999 · IEEE Transactions on Plasma Science

DOI:https://doi.org/10.1109/27.763044· OSTI ID:357676

Steffens, K L; Sobolewski, M A ^[1]

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1. National Inst. of Standards and Technology, Gaithersburg, MD (United States)

Planar laser-induced fluorescence was performed in the parallel-plate gaseous electronics conference reference cell to determine two-dimensional maps of the CF{sub 2} radical in 89% CF{sub 4}/11% O{sub 2} chamber-cleaning plasmas. The spatial characteristics of the CF{sub 2} density and of broadband optical emission were controlled by varying the current at the upper electrode by adjusting the impedance between the upper electrode and ground. The results suggest that electrical control of the current paths through the plasma could be used to control the spatial distribution of reactive chemical species, aiding in the optimization of chamber-cleaning plasmas.

• OSTI ID: 357676
• Journal Information: IEEE Transactions on Plasma Science, Journal Name: IEEE Transactions on Plasma Science Journal Issue: 1 Vol. 27; ISSN ITPSBD; ISSN 0093-3813
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
CARBON TETRAFLUORIDE
CHEMICAL REACTORS
HOMOGENEOUS PLASMA
PERFORMANCE
PLASMA DIAGNOSTICS
SPATIAL DISTRIBUTION
SURFACE CLEANING