Detection of CF/sub 2/ radicals in a plasma etching reactor by laser-induced fluorescence spectroscopy
Journal Article
·
· Appl. Phys. Lett.; (United States)
Laser-induced fluorescence spectroscopy was used to detect ground-state CF/sub 2/ radicals in 13.56-MHz discharge plasmas sustained in C/sub 2/F/sub 6/ and CF/sub 4/ in a plasma etching reactor. Measurements of the relative CF/sub 2/(X) density in each plasma as a function of discharge power demonstrated that CF/sub 2/ densities were significantly higher in the C/sub 2/F/sub 6/ plasma. These results provide the first direct observation of CF/sub 2/(X) radicals in a plasma etching reactor.
- Research Organization:
- Sandia National Laboratories, Albuquerque, New Mexico 87185
- OSTI ID:
- 5572687
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 40:9; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700102* -- Fusion Energy-- Plasma Research-- Diagnostics
CHEMICAL REACTIONS
DATA
ELECTRIC DISCHARGES
ELECTROMAGNETIC RADIATION
ENERGY LEVELS
ETCHING
EXPERIMENTAL DATA
FLUORESCENCE
FREQUENCY RANGE
GROUND STATES
INFORMATION
LASER RADIATION
LUMINESCENCE
MHZ RANGE
NUMERICAL DATA
PLASMA DIAGNOSTICS
QUANTITY RATIO
RADIATION EFFECTS
RADIATIONS
RADICALS
SPECTROSCOPY
SURFACE FINISHING
700102* -- Fusion Energy-- Plasma Research-- Diagnostics
CHEMICAL REACTIONS
DATA
ELECTRIC DISCHARGES
ELECTROMAGNETIC RADIATION
ENERGY LEVELS
ETCHING
EXPERIMENTAL DATA
FLUORESCENCE
FREQUENCY RANGE
GROUND STATES
INFORMATION
LASER RADIATION
LUMINESCENCE
MHZ RANGE
NUMERICAL DATA
PLASMA DIAGNOSTICS
QUANTITY RATIO
RADIATION EFFECTS
RADIATIONS
RADICALS
SPECTROSCOPY
SURFACE FINISHING