Spatial uniformity in chamber-cleaning plasmas measured using planar laser-induced fluorescence
- Process Measurements Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States)
Planar laser-induced fluorescence (PLIF) measurements were made to determine 2-D spatial maps of CF{sub 2} density as an indicator of chemical uniformity in 92%CF{sub 4}/O{sub 2} and 50%C{sub 2}F{sub 6}/O{sub 2} chamber-cleaning plasmas. Measurements were also made of broadband optical emission and of discharge current and voltage. All measurements were made in the Gaseous Electronics Conference (GEC) reference cell, a capacitively-coupled, parallel-plate platform designed to facilitate comparison of results among laboratories. The PLIF and emission results were found to correlate with discharge current and voltage measurements. Together, these optical and electrical measurements provide insight into the optimization of chamber-cleaning processes and reactors and suggest new methods of monitoring plasma uniformity.
- OSTI ID:
- 21202314
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 449; ISSN 0094-243X; ISSN APCPCS
- Country of Publication:
- United States
- Language:
- English
Similar Records
A comparative study of remote plasma sources for environmentally-friendly CVD chambers cleaning
Optical computer aided tomography measurements of plasma uniformity in an inductively coupled discharge