Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Characterization of InGaAsP/InP p-i-n solar cell structures using modulation spectroscopy and secondary ion mass spectrometry

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.369170· OSTI ID:295506
; ;  [1]; ; ; ;  [2]; ; ;  [3]
  1. Department of Physics and New York State Center for Advanced Technology in Ultrafast Photonic Materials and Applications at the City University of New York, Brooklyn College of the City University of New York, Brooklyn, New York 11210 (United States)
  2. Lucent Technologies, Bell Laboratories, Breinigsville, Pennsylvania 18031 (United States)
  3. Department of Physics and New York State Center for Advanced Technology in Ultrafast Photonic Materials and Applications at the City University of New York, City College of the City University of New York, New York, New York 10031 (United States)
We have investigated two In{sub 1{minus}x}Ga{sub x}As{sub y}P{sub 1{minus}y}/InP p-i-n multiple quantum well (MQW) solar cell structures (with and without gold contacts) with intrinsic (i)-InP spacers and two InP p-i-n control samples (with and without gold contacts) using electroreflectance (ER), piezoreflectance (PZR) and secondary ion mass spectrometry (SIMS). From a comparison of the rich ER/PZR spectra from the MQW regions (including the quantum confined Stark effect produced by an external bias) with an envelope function calculation (strain and electric field), we have been able to completely characterize the composition (x,y), strain and well width of the MQWs. From the electric fields originating in the i-InP region of the two InP p-i-n control samples, as determined from the observed Franz{endash}Keldysh oscillations (FKOs), we have evaluated the amount of {ital p}-dopant interdiffusion, in agreement with the SIMS data. The FKOs from the i-InP region of the MQW samples reveal an unusual effect, i.e., a modulation-doping field (superimposed on the p-i-n field) due to a transfer of charge from the n-InP layer to the nearest InGaAsP quantum well. {copyright} {ital 1999 American Institute of Physics.}
OSTI ID:
295506
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 3 Vol. 85; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English