Characterization of Ar/Cu electron-cyclotron-resonance plasmas using optical emission spectroscopy
- Oak Ridge National Laboratory, Solid State Division, P.O. Box 2008, Oak Ridge, Tennessee 37831-6057 (United States)
Optical emission spectroscopy is used to investigate trends with changes in processing parameters for Ar/Cu plasmas in an electron-cyclotron-resonance (ECR) plasma deposition system. The primary motivation for this work is to monitor trends in ionization fractions for copper deposition plasmas using a noninterfering diagnostic tool. The system, which consists of a solid copper sputter target coupled to a permanent magnet ECR microwave plasma system, is operated in the range of 1{endash}6 mTorr argon with net microwave input power of 500{endash}1500 W. Emission from the following excited states is monitored: Ar neutrals (696.5 nm); Ar ions (488 nm); Cu neutrals (521.8 and 216.5 nm); and Cu ions (213.6 nm). Cu ion emission and Cu neutral emission monotonically increase with net microwave input power but at slightly different rates for different pressures, while argon-ion emission as a function of pressure shows a broad peak around 4 mTorr. The ratio of Cu ion emission to Cu neutral emission is used as an indicator of the relative ionization efficiency for Cu and peaks near 5 mTorr. Spectroscopic estimates of electron temperature differences between pure Ar and Ar/Cu plasmas are also presented.
- Research Organization:
- Oak Ridge National Laboratory
- DOE Contract Number:
- AC05-96OR22464
- OSTI ID:
- 286543
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 5 Vol. 80; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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