Near-edge x-ray absorption fine structure examination of chemical bonding in sputter deposited boron and boron-nitride films
Conference
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OSTI ID:230364
- and others
Near-edge x-ray absorption fine structure (NEXAFS) is used to examine the chemical bonding in boron and boron-nitride films sputter deposited from a fully-dense, pure boron target. Reactive sputtering is used to prepare the boron-nitride and multilayered films. Although the process of sputter deposition often produces films that lack long range order, NEXAFS reveals the distinguishing features of sp{sup 2} and sp{sup 3} hybridization that are associated with different crystalline structures. The sensitivity of NEXAFS to local order further provides details in bonding modifications that exist in these films.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48; AC03-76SF00098
- OSTI ID:
- 230364
- Report Number(s):
- UCRL-JC-123925; CONF-960401-23; ON: DE96010243; TRN: 96:003008
- Resource Relation:
- Conference: Spring meeting of the Materials Research Society (MRS), San Francisco, CA (United States), 8-12 Apr 1996; Other Information: PBD: May 1996
- Country of Publication:
- United States
- Language:
- English
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