Nitrogen implantation effects on the chemical bonding and hardness of boron and boron nitride coatings

Conference · Mon Feb 08 04:00:00 EST 1999

OSTI ID:14547

Anders, S ^[1]; Felter, T; Hayes, J; Jankowski, A F; Patterson, R; Poker, D; Stamler, T

---

1. LLNL

Boron nitride (BN) coatings are deposited by the reactive sputtering of fully dense, boron (B) targets utilizing an argon-nitrogen (Ar-N{sub 2}) reactive gas mixture. Near-edge x-ray absorption fine structure analysis reveals features of chemical bonding in the B 1s photoabsorption spectrum. Hardness is measured at the film surface using nanoindentation. The BN coatings prepared at low, sputter gas pressure with substrate heating are found to have bonding characteristic of a defected hexagonal phase. The coatings are subjected to post-deposition nitrogen (N{sup +} and N{sub 2}{sup +}) implantation at different energies and current densities. The changes in film hardness attributed to the implantation can be correlated to changes observed in the B 1s NEXAFS spectra.

• Research Organization: Lawrence Livermore National Lab., CA (US)
• Sponsoring Organization: USDOE Office of Defense Programs (DP) (US)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 14547
• Report Number(s): UCRL-JC-133133; YN0100000; YN0100000
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
BORON
BORON NITRIDES
CHEMICAL BONDS
COATINGS
HARDNESS
ION IMPLANTATION
NITROGEN
RADIATION EFFECTS
SPUTTERING