Properties of boron/boron-nitride multilayers
Conference
·
OSTI ID:257300
- Lawrence Livermore National Lab., CA (United States)
- Oak Ridge National Lab., TN (United States)
Boron-Nitride films are of interest for their high hardness and wear resistance. Large intrinsic stresses and poor adhesion which often accompany high hardness materials can be moderated through the use of a layered structure. Alternate layers of boron (B) and boron-nitride (BN) are formed by modulating the composition of the sputter gas during deposition from a pure B target. The thin films are characterized with TEM to evaluate the microstructure and with nanoindentation to determine hardness. Layer pair spacing and continuity effects on hardness are evaluated for the B/BN films.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States); Oak Ridge National Lab., TN (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States); Oak Ridge National Lab., TN (United States)
- DOE Contract Number:
- W-7405-ENG-48; AC05-84OR21400
- OSTI ID:
- 257300
- Report Number(s):
- UCRL-JC--123992; CONF-960753--1; ON: DE96012370
- Country of Publication:
- United States
- Language:
- English
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