Near-edge x-ray absorption fine structure examination of chemical bonding in sputter deposited boron and boron-nitride films
Conference
·
OSTI ID:230364
- and others
Near-edge x-ray absorption fine structure (NEXAFS) is used to examine the chemical bonding in boron and boron-nitride films sputter deposited from a fully-dense, pure boron target. Reactive sputtering is used to prepare the boron-nitride and multilayered films. Although the process of sputter deposition often produces films that lack long range order, NEXAFS reveals the distinguishing features of sp{sup 2} and sp{sup 3} hybridization that are associated with different crystalline structures. The sensitivity of NEXAFS to local order further provides details in bonding modifications that exist in these films.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48; AC03-76SF00098
- OSTI ID:
- 230364
- Report Number(s):
- UCRL-JC--123925; CONF-960401--23; ON: DE96010243
- Country of Publication:
- United States
- Language:
- English
Similar Records
Nanohardness and chemical bonding of Boron Nitride films
Nitrogen implantation effects on the chemical bonding and hardness of boron and boron nitride coatings
Morphology and bonding measured from boron-nitride powders and films using near-edge x-ray absorption fine structure
Conference
·
Wed Jul 08 00:00:00 EDT 1998
·
OSTI ID:14546
Nitrogen implantation effects on the chemical bonding and hardness of boron and boron nitride coatings
Conference
·
Sun Feb 07 23:00:00 EST 1999
·
OSTI ID:14547
Morphology and bonding measured from boron-nitride powders and films using near-edge x-ray absorption fine structure
Journal Article
·
Fri Jul 01 00:00:00 EDT 1994
· Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
·
OSTI ID:7174997