Characterizing the structure of topological insulator thin films
- Department of Physics, The Pennsylvania State University, University Park, Pennsylvania 16802 (United States)
We describe the characterization of structural defects that occur during molecular beam epitaxy of topological insulator thin films on commonly used substrates. Twinned domains are ubiquitous but can be reduced by growth on smooth InP (111)A substrates, depending on details of the oxide desorption. Even with a low density of twins, the lattice mismatch between (Bi, Sb){sub 2}Te{sub 3} and InP can cause tilts in the film with respect to the substrate. We also briefly discuss transport in simultaneously top and back electrically gated devices using SrTiO{sub 3} and the use of capping layers to protect topological insulator films from oxidation and exposure.
- OSTI ID:
- 22499271
- Journal Information:
- APL Materials, Journal Name: APL Materials Journal Issue: 8 Vol. 3; ISSN 2166-532X; ISSN AMPADS
- Country of Publication:
- United States
- Language:
- English
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