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Gallium loading of gold seed for high yield of patterned GaAs nanowires

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4894288· OSTI ID:22310976
A method is presented for maximizing the yield and crystal phase purity of vertically aligned Au-assisted GaAs nanowires grown with an SiO{sub x} selective area epitaxy mask on GaAs (111)B substrates. The nanowires were grown by the vapor-liquid-solid (VLS) method in a gas source molecular beam epitaxy system. During annealing, Au VLS seeds will alloy with the underlying GaAs substrate and collect beneath the SiO{sub x} mask layer. This behavior is detrimental to obtaining vertically aligned, epitaxial nanowire growth. To circumvent this issue, Au droplets were pre-filled with Ga assuring vertical yields in excess of 99%.
OSTI ID:
22310976
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 8 Vol. 105; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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