skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Effect of (Bi, La)(Fe, Zn)O{sub 3} thickness on the microstructure and multiferroic properties of BiFeO{sub 3} thin films

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4764340· OSTI ID:22089572
; ;  [1]
  1. Department of Materials Science, Sichuan University, Chengdu 610064 (China)

The effect of Bi{sub 0.90}La{sub 0.10}Fe{sub 0.90}Zn{sub 0.10}O{sub 3} (BLFZO) thicknesses on the microstructure and multiferroic properties of BiFeO{sub 3} (BFO) thin films was investigated, and all bilayered thin films were grown on Pt-coated silicon substrates without any buffer layers by a radio frequency sputtering. A (110) orientation is dominant in all the bilayers, and two grain growth modes are identified in these bilayers by using an atomic force microscope, where different grain growth modes significantly affect their leakage behavior. The dielectric constant ({epsilon}{sub r}) of bilayers gradually increases, and magnetic properties were deteriorated with the addition of BLFZO with a higher {epsilon}{sub r} and a weaker magnetic behavior. An enhanced ferroelectric behavior of 2P{sub r} {approx} 116.2 {mu}C/cm{sup 2} and 2E{sub c} {approx} 524 kV/cm could be observed in the BFO/BLFZO bilayered thin film with 80 nm BLFZO layer owing to a higher orientation degree of (110) and an interface coupling together with a lower leakage current density. As a result, electrical properties of BFO could be tailored by modifying the thicknesses of BLFZO.

OSTI ID:
22089572
Journal Information:
Journal of Applied Physics, Vol. 112, Issue 9; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English