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Title: Investigation of structure and magnetoresistance in Co/ZnO films

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3511752· OSTI ID:21537937
; ;  [1]; ;  [2]
  1. School of Chemistry and Materials Science, Shanxi Normal University, Linfen 041004 (China)
  2. Department of Physics and Astronomy, University of Sheffield, Hicks Building, Sheffield S3 7RH (United Kingdom)

Co/ZnO films were deposited on glass substrates by magnetron sputtering at room temperature. The structure of the as-deposited films is studied by means of x-ray diffraction, x-ray photoelectron spectroscopy, and the zero-field-cooled and field-cooled magnetization curves. It is shown that the as-deposited samples consist of a mixture of regions of metallic Co and semiconducting ZnO. Large negative magnetoresistance of 26% and 11.9% are observed in the as-deposited Co/ZnO film with Co concentration of 50.7 at. % at 10 K and room temperature, respectively. Structural analysis, the temperature dependence of the conductivity and magnetoresistance reveal that the magnetoresistance is induced by spin-dependent tunneling between regions of conducting magnetic Co through the ZnO semiconducting barriers. The enhanced magnetoresistance in the low temperature regime may be related to the existence of higher-order tunneling processes between large Co regions mediated by small Co particles.

OSTI ID:
21537937
Journal Information:
Journal of Applied Physics, Vol. 108, Issue 10; Other Information: DOI: 10.1063/1.3511752; (c) 2010 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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