Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Role of Coulomb blockade and spin-flip scattering in tunneling magnetoresistance of FeCo-Si-O nanogranular films

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3561438· OSTI ID:21538224
;  [1]; ; ; ;  [2];  [2]; ;  [3]
  1. Nanostech Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016 (India)
  2. Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, P.O. Box 510119, 01314 Dresden (Germany)
  3. Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067 (India)
In this work, we report the effect of FeCo atomic fraction (0.33 < x < 0.54) and temperature on the electrical, magnetic, and tunneling magnetoresistance (TMR) properties of FeCo-Si-O granular films prepared by atom beam sputtering technique. Glancing angle x-ray diffraction and TEM studies reveal that films are amorphous in nature. The dipole-dipole interactions (particle-matrix mixing) is evident from zero-field cooled and field-cooled magnetic susceptibility measurements and the presence of oxides (mainly Fe-related) is observed by x-ray photoelectron spectroscopy analysis. The presence of Fe-oxides is responsible for the observed reduction of saturation magnetization and rapid increase in coercivity below 50 K. TMR has been observed in a wide temperature range, and a maximum TMR of -4.25% at 300 K is observed for x = 0.39 at a maximum applied field of 60 kOe. The fast decay of maximum TMR at high temperatures and lower TMR values at 300 K when compared to P{sub FeCo}{sup 2}/(1+P{sub FeCo}{sup 2}), where P{sub FeCo} is the spin polarization of FeCo are in accordance with a theoretical model that includes spin-flip scattering processes. The temperature dependent study of TMR effect reveals a remarkably enhanced TMR at low temperatures. The TMR value varies from -2.1% at 300 K to -14.5% at 5 K for x = 0.54 and a large MR value of -18.5% at 5 K for x = 0.39 is explained on the basis of theoretical models involving Coulomb blockade effects. Qualitatively particle-matrix mixing and the presence of Fe-oxides seems to be the source of spin-flip scattering, responsible for fast decay of TMR at high temperatures. A combination of higher order tunneling (in Coulomb blockade regime) and spin-flip scattering (high temperature regime) explains the temperature dependent TMR of these films.
OSTI ID:
21538224
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 7 Vol. 109; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English