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Correlation between structure and electrical transport in ion-irradiated graphene grown on Cu foils

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3536529· OSTI ID:21518254
; ;  [1]; ;  [2];  [1]
  1. Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)
  2. Naval Research Laboratory, Washington, D.C. 20375 (United States)
Graphene grown by chemical vapor deposition and supported on SiO{sub 2} and sapphire substrates was studied following the controlled introduction of defects induced by 35 keV carbon ion irradiation. Changes in Raman spectra for fluences ranging from 10{sup 12} to 10{sup 15} cm{sup -2} indicate that the structure of graphene evolves from a highly ordered layer, to a patchwork of disordered domains, to an essentially amorphous film. These structural changes result in a dramatic decrease in the Hall mobility by orders of magnitude while, remarkably, the Hall concentration remains almost unchanged, suggesting that the Fermi level is pinned at a hole concentration near 1x10{sup 13} cm{sup -2}. A model for scattering by resonant scatterers is in good agreement with mobility measurements up to an ion fluence of 1x10{sup 14} cm{sup -2}.
OSTI ID:
21518254
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 3 Vol. 98; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English