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Influence of annular magnet on discharge characteristics in enhanced glow discharge plasma immersion ion implantation

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3537962· OSTI ID:21518241
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  1. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon (Hong Kong)
  2. Department 702, School of Mechanical and Automation Engineering, Beijing University of Aeronautics and Astronautics, Beijing (China)
A permanent annular magnet positioned at the grounded anode alters the discharge characteristics in enhanced glow discharge plasma immersion ion implantation (EGD-PIII). The nonuniform magnetic field increases the electron path length and confines electron motion due to the magnetic mirror effect and electron-neutral collisions thus occur more frequently. The plasma potential and ion density measured by a Langmuir probe corroborate that ionization is improved near the grounded anode. This hybrid magnetic field EGD-PIII method is suitable for implantation of gases with low ionization rates.
OSTI ID:
21518241
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 2 Vol. 98; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English