Experimental investigation of hybrid-evaporation-glow discharge plasma immersion ion implantation

Journal Article · Wed Jun 01 04:00:00 EDT 2005 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1924880· OSTI ID:20711701

Li, L H; Wu, Y Q; Zhang, Y H; Fu, Ricky K.Y.; Chu, Paul K ^[1]

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1. Department of 702, School of Mechanical Engineering and Automation, Beijing University of Aeronautics and Astronautics, Beijing 100083 (China)

High-voltage pulsed glow discharge is applied to plasma immersion ion implantation (PIII). In the glow discharge, the target constitutes the cathode and the gas tube forms the anode under a relatively high working gas pressure of 0.15-0.2 Pa. The characteristics of the glow discharge and ion density are measured experimentally. Our results show resemblance to hollow-anode glow discharge and the anode fall is faster than that of general glow discharge. Because of electron focusing in the anode tube orifice, ions are ionized efficiently and most of them impact the negatively biased samples. The resulting ion current density is higher than that in other PIII modes and possible mechanisms of the glow discharge PIII are proposed and discussed.

• OSTI ID: 20711701
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 97; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
BEAM OPTICS
CATHODES
CURRENT DENSITY
ELECTRIC POTENTIAL
ELECTRON BEAMS
EVAPORATION
FOCUSING
GLOW DISCHARGES
HOLLOW ANODES
ION DENSITY
ION IMPLANTATION
IONIZATION
PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS
PRESSURE RANGE MILLI PA
TUBES