Impact energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation

Journal Article · Mon Aug 10 04:00:00 EDT 2009 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3204697· OSTI ID:21294231

Lu, Q Y; Fu, Ricky K. Y.; Chu, Paul K ^[1]; Li, L H; Li, J H ^[1]

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1. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon (Hong Kong)

The implantation energy and retained dose uniformity in enhanced glow discharge plasma immersion ion implantation (EGD-PIII) is investigated numerically and experimentally. Depth profiles obtained from different samples processed by EGD-PIII and traditional PIII are compared. The retained doses under different pulse widths are calculated by integrating the area under the depth profiles. Our results indicate that the improvement in the impact energy and retained dose uniformity by this technique is remarkable.

• OSTI ID: 21294231
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 6 Vol. 95; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
GLOW DISCHARGES
ION IMPLANTATION
PLASMA
PULSES