Investigation of plasma distribution in electron-focused electric field enhanced glow discharge plasma immersion ion implantation

Journal Article · Fri Aug 15 04:00:00 EDT 2008 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2969050· OSTI ID:21137443

Qiuyuan, Lu; Liuhe, Li ^[1]; Fu, Ricky K. Y.; Chu, Paul K ^[1]

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1. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon (Hong Kong)

In enhanced glow discharge plasma immersion ion implantation (EGDPIII) that involves a small pointed anode and large area tabular cathode, the high negative substrate bias not only acts as the plasma producer but also supplies the implantation voltage. Consequently, an electric field is created to focus the electrons and the electron-focusing field enhances the glow discharge process. In this work, the plasma distribution is measured using a Langmuir probe to obtain the plasma density. Numerical interpolation is performed to obtain the plasma density distribution throughout the entire discharge region. The effects of different distances between the anode and cathode on the glow discharge characteristics and the influence of the plasma electron density are also evaluated. Our results experimentally verify the electron-focusing phenomenon and suggest optimal processing windows for enhanced ionization rates and efficiency in EGDPIII.

• OSTI ID: 21137443
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 4 Vol. 104; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ANODES
CATHODES
ELECTRIC FIELDS
ELECTRIC POTENTIAL
ELECTRON DENSITY
ELECTRONS
FOCUSING
GLOW DISCHARGES
INTERPOLATION
ION IMPLANTATION
IONIZATION
LANGMUIR PROBE
PLASMA
PLASMA DENSITY
SUBSTRATES