Theoretical investigation of sheath expansion and implant fluence uniformity in enhanced glow discharge plasma immersion ion implantation

Journal Article · Mon Sep 01 04:00:00 EDT 2008 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2977962· OSTI ID:21175550

Kwok, Dixon T. K.; Fu, Ricky K. Y.; Chu, Paul K ^[1]; Qiuyuan, Lu; Liuhe, Li ^[1]

---

1. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon (Hong Kong)

In enhanced glow discharge plasma immersion ion implantation that involves a small-pointed anode and large area tabular cathode, the high negative substrate bias acts as the plasma producer and supplies the implantation voltage. An electric field is created to focus the electrons and the electron-focusing field in turn enhances the glow discharge process. The sheath physics is theoretically investigated using numerical simulation based on the multiple-grid particle-in-cell code. Electron focusing is corroborated and the plasma sheath has enough expansion when t=40 {mu}s so that a uniform distribution of the incident ion fluence is attained.

• OSTI ID: 21175550
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 9 Vol. 93; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ANODES
CATHODES
ELECTRIC FIELDS
ELECTRIC POTENTIAL
ELECTRONS
EXPANSION
FOCUSING
GLOW DISCHARGES
ION IMPLANTATION
PLASMA
PLASMA SHEATH
PLASMA SIMULATION
SUBSTRATES