Plasma sheath physics and dose uniformity in enhanced glow discharge plasma immersion ion implantation and deposition

Journal Article · Wed Jul 01 04:00:00 EDT 2009 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3160309· OSTI ID:21359275

Liuhe, Li; Jianhui, Li ^[1]; Kwok, Dixon T. K.; Chu, Paul K ^[2]; Zhuo, Wang ^[1]

---

1. Department 702, School of Mechanical and Automation Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100191 (China)
2. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon (Hong Kong)

Based on the multiple-grid particle-in-cell code, an advanced simulation model is established to study the sheath physics and dose uniformity along the sample stage in order to provide the theoretical basis for further improvement of enhanced glow discharge plasma immersion ion implantation and deposition. At t=7.0 mus, the expansion of the sheath in the horizontal direction is hindered by the dielectric cage. The electron focusing effect is demonstrated by this model. Most of the ions at the inside wall of the cage are implanted into the edge of the sample stage and a relatively uniform ion fluence distribution with a large peak is observed at the end. Compared to the results obtained from the previous model, a higher implant fluence and larger area of uniformity are disclosed.

• OSTI ID: 21359275
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 1 Vol. 106; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
DEPOSITION
DIELECTRIC MATERIALS
ELECTRIC DISCHARGES
EXPANSION
FOCUSING
GLOW DISCHARGES
ION IMPLANTATION
MATERIALS
PLASMA SHEATH
PLASMA SIMULATION
SIMULATION