Giant Magnetoresistance In Ni/Cu Multilayers Fabricated By Electron-Beam Evaporation
Journal Article
·
· AIP Conference Proceedings
- Department of Materials and Metallurgical Engineering Indian Institute of Technology Kanpur, Uttar Pradesh, 208016 (India)
Electron beam evaporation technique has been used to deposit the multilayers of Ni-Cu, represented by Si[BL{sub t}/[Ni(t{sub FM})/Cu(t{sub NM})]xn] where Si is used as a substrate and BL is buffer layer, n is the number of bilayers, t, t{sub FM} and t{sub NM} are thicknesses of buffer layer, ferromagnetic (Ni) and nonmagnetic (Cu) layers, respectively. We characterize the multilayers using M-H curves, magnetoresistance measurement (at room temperature)
- OSTI ID:
- 21137094
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1003; ISSN APCPCS; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
Similar Records
Preparation of giant magnetoresistance Co/Cu multilayers by electrodeposition
Magnetoresistance and anisotropy of the resistivity in Ni/Nb and Ni/Si multilayers
Perpendicularly magnetized spin filtering Cu/Ni multilayers
Journal Article
·
Tue Dec 31 23:00:00 EST 1996
· Journal of the Electrochemical Society
·
OSTI ID:452203
Magnetoresistance and anisotropy of the resistivity in Ni/Nb and Ni/Si multilayers
Journal Article
·
Mon Nov 14 23:00:00 EST 1988
· J. Appl. Phys.; (United States)
·
OSTI ID:7017023
Perpendicularly magnetized spin filtering Cu/Ni multilayers
Journal Article
·
Sun Jan 19 23:00:00 EST 2014
· Applied Physics Letters
·
OSTI ID:22280604