Preparation of giant magnetoresistance Co/Cu multilayers by electrodeposition

Journal Article · Wed Jan 01 04:00:00 EST 1997 · Journal of the Electrochemical Society

DOI:https://doi.org/10.1149/1.1837354· OSTI ID:452203

Jyoko, Yukimi; Kashiwabara, Satoshi; Hayashi, Yasunori ^[1]

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1. Kyushu Univ., Fukuoka (Japan). Dept. of Materials Science and Engineering

Reflection electron microscopy of electrodeposited Co, Cu/(111) Pt ultrathin layers and bilayers has revealed a heteroepitaxial and simultaneous multinuclear multilayer growth. Giant magnetoresistance and oscillatory antiferromagnetic interlayer coupling have been observed in a (111) textured Co/Cu multilayered nanostructure, which is compositionally modulated over nanometer length scales with distinct ferromagnetic Co-Cu alloy and nonmagnetic Cu layers, prepared by electrodeposition under potential control in the presence of a very slight amount of CrO{sub 3}. Such a multilayered structure containing a nominal Cu spacer layer thickness of 3.2 nm exhibits a large saturation magnetoresistance of more than 18% at room temperature. Currently the development of new magnetic multilayered nanostructures has attracted considerable attention for potential applicability to magnetoresistive sensor devices.

• Sponsoring Organization: USDOE
• OSTI ID: 452203
• Journal Information: Journal of the Electrochemical Society, Journal Name: Journal of the Electrochemical Society Journal Issue: 1 Vol. 144; ISSN 0013-4651; ISSN JESOAN
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
COBALT ALLOYS
COMPOSITE MATERIALS
COPPER ALLOYS
ELECTRODEPOSITION
LAYERS
MAGNETORESISTANCE
MICROSTRUCTURE