Effect of antenna capacitance on the plasma characteristics of an internal linear inductively coupled plasma system
- Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do, 440-746 (Korea, Republic of)
This study examined the effect of the antenna capacitance of an inductively coupled plasma (ICP) source, which was varied using an internal linear antenna, on the electrical and plasma characteristics of the ICP source. The inductive coupling at a given rf current increased with decreasing antenna capacitance. This was caused by a decrease in the inner copper diameter of the antenna made from coaxial copper/quartz tubing, which resulted in a higher plasma density and lower plasma potential. By decreasing the diameter of the copper tube from 25 to 10 mm, the plasma density of a plasma source size of 2750x2350 mm{sup 2} was increased from approximately 8x10{sup 10}/cm{sup 3} to 1.5x10{sup 11}/cm{sup 3} at 15 mTorr Ar and 9 kW of rf power.
- OSTI ID:
- 21120539
- Journal Information:
- Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 8 Vol. 15; ISSN PHPAEN; ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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