LLNL large-area inductively coupled plasma (ICP) source: Experiments
- Lawrence Livermore National Lab., CA (United States)
The authors describe initial experiments with a large (76-cm diameter) plasma source chamber to explore the problems associated with large-area inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400-mm semiconductor wafers. These experiments typically use a 640-mm diameter planar ICP coil deriven at 13.56 MHz. Plasma and system data are taken in Ar and N{sub 2} over the pressure range 3-50 mtorr. RF, inductive power was run up to 2000W, but typically data were taken over the range 100-1000W. Diagnostics include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The B-dot and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400-mm processing are attainable.
- Research Organization:
- International Union of Pure and Applied Chemistry; American Physical Society, New York, NY (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 223664
- Report Number(s):
- CONF-950875--Vol.1
- Country of Publication:
- United States
- Language:
- English
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