Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing
- Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do, 440-746 (Korea, Republic of)
The variation in plasma uniformity over an extremely large size inductively coupled plasma (ICP) source of 2750x2350 mm{sup 2} was examined. An internal linear-type antenna called ''double comb-type antenna'' was used as the ICP source. A plasma density of {approx}1.4x10{sup 11}/cm{sup 3} could be obtained at 5 mTorr Ar by applying 10 kW rf power to the source at a frequency of 13.56 MHz. An increase in rf power from 1 to 10 kW improved the plasma uniformity over a substrate area of 2300x2000 mm{sup 2} from 18.1% to 11.4%. The improvement in uniformity of the internal ICP source was attributed to the increase in plasma density near the wall.
- OSTI ID:
- 21016309
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 5 Vol. 92; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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