Reduction of the electrostatic coupling in a large-area internal inductively coupled plasma source using a multicusp magnetic field
- Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do, 440-746 (Korea, Republic of)
A large area (1020 mmx830 mm) inductively coupled plasma (ICP) source has been developed using an internal-type linear antenna with permanent magnets forming a multicusp magnetic field. The large rf antenna voltages, which cause the electrostatic coupling between the antenna and the plasma in a large area internal-type linear-antenna ICP source, were decreased significantly by applying the magnetic field near and parallel to the antenna. Through the application of the magnetic field, an approximately 20% higher plasma density, with a value of close to 1.0x10{sup 11} cm{sup -3} at a rf power of 2000 W, and about three times higher photoresist etch rates were observed, while maintaining the plasma nonuniformity at less than 9%.
- OSTI ID:
- 20632769
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 10 Vol. 85; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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