Effective plasma confinement by applying multipolar magnetic fields in an internal linear inductively coupled plasma system
- Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do 440-746 (Korea, Republic of)
A novel internal-type linear inductive antenna referred to as 'double comb-type antenna' was used for a large-area plasma source with the substrate area of 880 mmx660 mm and the effect of plasma confinement by applying multi-polar magnetic field was investigated. High-density plasmas on the order of 3.18x10{sup 11} cm{sup -3}, which is 50% higher than that obtained for the source without the magnetic field, could be obtained at the pressure of 15 mTorr Ar and at the inductive power of 5000 W with good plasma stability. The plasma uniformity less than 3% could also be obtained within the substrate area. When SiO{sub 2} film was etched using the double comb-type antenna, the average etch rate of about 2100 A/min could be obtained with the etch uniformity of 5.4% on the substrate area using 15 mTorr SF{sub 6}, 5000 W of rf power, and -34 V of dc bias voltage.
- OSTI ID:
- 20779124
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 16 Vol. 88; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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